Osaka (Japan) 22 – 24 July 2019 Invited talk (L.Favré) “Si-Ge Strain Engineering: from Thin Layers to Nanowires”
Clermont-Ferrand (FR), July 2019 Invited talk (M.Salvalaglio) Processus ULtimes de l’epitaxie des SEmi-conducteurs,
Lecce (Italy), 27 -31 May 2019 Invited talk (M.Abbarchi): “Bottom-up and top-down fabrication methods for Titania-based dielectric metasurfaces”
Galapagos (Ecuador), 22-26 April 2019 Invited talk (M.Abbarchi ): “Solid-state dewetting of Si(Ge)-based complex nano architecture and their applications in photonic”
